Suwon, South Korea

Eunjoo Lee

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eunjoo Lee. Retrieved from https://idiyas.com/inventor/eunjoo-lee-4vqlvwaj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Eunjoo Lee - Innovator in Optical Measurement Technology

Introduction

Eunjoo Lee is an accomplished inventor based in Suwon-si, South Korea. She has made significant contributions to the field of optical measurement technology. Her innovative approach focuses on developing advanced optical measurement apparatuses and methods.

Latest Patent Applications

Eunjoo Lee's notable patent application is titled "OPTICAL MEASUREMENT APPARATUS AND OPTICAL MEASUREMENT METHOD." This application describes an optical measurement apparatus that includes a first light emitter designed to emit a first light on a surface of a sample. Additionally, it features a second light emitter that emits a second light on the same surface where the first light is focused. The apparatus also includes a physical property detector that obtains physical property information of the sample by detecting changes in the amount of light from the second light due to the photothermal effect of the first light. Furthermore, it has at least one structure detector that gathers structural information by detecting reflected light from the first and second lights.

Conclusion

Eunjoo Lee's work in optical measurement technology showcases her innovative spirit and dedication to advancing scientific understanding. Her contributions, particularly through her patent application, highlight her potential impact in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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