Eun Kyung Baek

Title: Innovator Eun Kyung Baek: Pioneering Carbon Polymer Film Technology

Introduction

Eun Kyung Baek, based in Hwasung, South Korea, is an accomplished inventor known for her innovative contributions to semiconductor technology. With a focus on developing methods to enhance material properties, she has made significant strides in the field of carbon polymer films.

Latest Patents

Eun Kyung Baek holds a patent for her groundbreaking invention titled "Method of forming carbon polymer film using plasma CVD". This patent outlines a sophisticated process of forming a hydrocarbon-containing polymer film on a semiconductor substrate utilizing a capacitively-coupled plasma chemical vapor deposition (CVD) apparatus. The method involves vaporizing a hydrocarbon-containing liquid monomer and introducing it into a CVD reaction chamber alongside gases like CO or H, leading to polymerization that improves mechanical hardness while reducing the extinction coefficient at 193 nm.

Career Highlights

Throughout her career, Eun Kyung Baek has worked with notable companies including ASM Japan K.K. and Samsung Electronics Co., Ltd. Her experiences in these leading firms have provided her with a wealth of knowledge and expertise in semiconductor manufacturing processes.

Collaborations

Eun Kyung has collaborated with esteemed colleagues such as Yoshinori Morisada and Kamal Kishore Goundar. Together, they have explored various avenues of research, aiding in the advancement of polymerization techniques and further innovating in the field of materials science.

Conclusion

Eun Kyung Baek's contributions to the field of carbon polymer films are substantial and showcase her role as a key player in semiconductor innovation. Her patent is a testament to her dedication to advancing technology and improving material properties, positioning her as a significant inventor in the industry.