Company Filing History:
Years Active: 2014
Title: Inventor Eun Kyeong Kim: Innovating Low Dielectric Constant Thin Films
Introduction: Eun Kyeong Kim is an accomplished inventor based in Seoul, South Korea. With a focus on advanced materials, she has contributed significantly to the development of low dielectric constant thin films. Her work not only enhances the performance of electronic devices but also addresses the growing need for efficient materials in the semiconductor industry.
Latest Patents: Eun Kyeong Kim holds a pivotal patent titled "Siloxane-based low dielectric constant thin films using cyclo-siloxane and a method for preparing the same." This innovation presents a low-dielectric constant thin film produced from a silsesquioxane polymer matrix. The method involves the preparation of silsesquioxane sol by incorporating a stereoisomer of a multi-reactive cyclosiloxane into an alkoxysilane. Remarkably, the thin film maintains stability even at a curing temperature of -500°C without decomposing. It demonstrates a uniform surface property with low surface modulus and exhibits superior coatability, allowing smooth application without cracks, even at thicknesses of 500 nm or greater.
Career Highlights: Eun Kyeong Kim is affiliated with the Korea Institute of Science and Technology, where her innovative research and patent contributions continue to push the boundaries of material science. Her expertise in siloxane chemistry and thin film technology places her at the forefront of her field.
Collaborations: Throughout her career, Eun Kyeong Kim has collaborated with esteemed colleagues such as Kyung Youl Baek and Seung Sang Hwang. These partnerships have facilitated the exchange of ideas and fostered a collaborative environment that enhances the quality and impact of their research.
Conclusion: Eun Kyeong Kim exemplifies the spirit of innovation in the realm of material science. Her patented work on siloxane-based low dielectric constant thin films marks a significant advancement, reflecting her dedication to developing efficient materials for modern technological applications. As she continues her research at the Korea Institute of Science and Technology, her contributions are poised to influence future innovations in the semiconductor industry.