The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2014
Filed:
Oct. 21, 2010
Kyung Youl Baek, Seoul, KR;
Seung Sang Hwang, Seoul, KR;
Seung-sock Choi, Seoul, KR;
Sungyoun OH, Seoul, KR;
He Seung Lee, Seoul, KR;
Eun Kyeong Kim, Seoul, KR;
Kyung Youl Baek, Seoul, KR;
Seung Sang Hwang, Seoul, KR;
Seung-Sock Choi, Seoul, KR;
Sungyoun Oh, Seoul, KR;
He Seung Lee, Seoul, KR;
Eun Kyeong Kim, Seoul, KR;
Abstract
A low-dielectric constant thin film prepared from a silsesquioxane polymer matrix as a precursor and a method for preparing the same which comprises preparing silsesquioxane sol by adding a stereoisomer of a multi reactive cyclosiloxane to an alkoxysilane are provided. The low-dielectric-constant thin film retains a stable film state even at a curing temperature of −500° C. without being decomposed, a very uniform surface property with a low surface modulus, and a superior coatability as to be coatable smoothly with no crack even with a thickness of 500 nm or larger.