Gimpo, South Korea

Eun-Ju Park

This inventor holds 1 USPTO granted patent. Top assignee: Lg Display Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eun-Ju Park. Retrieved from https://idiyas.com/inventor/eun-ju-park-7j8h7fds

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Eun-Ju Park: Innovator in Transparent Adhesive Technology

Eun-Ju Park is a notable inventor based in Gimpo, South Korea. She has made significant contributions to the field of adhesive technology, particularly with her innovative work on transparent adhesive compositions.

Latest Patents

Eun-Ju Park holds 1 patent for her invention titled "Transparent adhesive composition, transparent adhesive layer and display device including the same." This patent includes a unique formulation that comprises a silicon acrylate monomer, a silanol compound, an alkoxy silane compound, and an optical initiator. Her work in this area has the potential to enhance the performance and functionality of display devices.

Career Highlights

Eun-Ju Park is currently employed at LG Display Co., Ltd., where she continues to develop cutting-edge technologies in the display industry. Her role at the company allows her to apply her expertise in adhesive compositions to real-world applications, contributing to advancements in display technology.

Collaborations

Eun-Ju has collaborated with talented coworkers, including Jae-Yeong Kim and Won-Bong Jang. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Eun-Ju Park is a pioneering inventor whose work in transparent adhesive technology is shaping the future of display devices. Her contributions to the field are noteworthy and demonstrate her commitment to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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