Eun Jin Shim

Title: Eun Jin Shim - Innovator in Multilayer Capacitor Technology

Introduction

Eun Jin Shim is a prominent inventor based in Suwon-si, South Korea. She has made significant contributions to the field of electronics, particularly in the development of multilayer capacitors. With a total of three patents to her name, her work has garnered attention in the industry.

Latest Patents

Eun Jin Shim's latest patents focus on a multilayer capacitor featuring an internal electrode with a double bottleneck structure. This innovative design includes a body composed of dielectric layers and internal electrodes, along with external electrodes connected to the internal electrodes. The structure is designed with opposing surfaces that enhance the capacitor's functionality. Notably, at least one of the internal electrodes incorporates a first bottleneck structure, which has a directional length in a third-directional outer region that is smaller than the inner region. Additionally, a second bottleneck structure is present, further optimizing the capacitor's performance.

Career Highlights

Eun Jin Shim is currently employed at Samsung Electro-Mechanics Co., Ltd., where she continues to push the boundaries of capacitor technology. Her work has been instrumental in advancing the capabilities of electronic components, making them more efficient and reliable.

Collaborations

Eun Jin Shim has collaborated with notable colleagues, including Sun Hwa Kim and Jong Ho Lee. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Eun Jin Shim's contributions to multilayer capacitor technology exemplify her dedication to innovation in the electronics field. Her patents reflect a commitment to enhancing the performance of electronic components, solidifying her status as a leading inventor in her industry.