Seoul, South Korea

Eun Je Hyun

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eun Je Hyun. Retrieved from https://idiyas.com/inventor/eun-je-hyun

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Eun Je Hyun: Innovator in Image Sensor Technology

Introduction

Eun Je Hyun is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of image sensor technology, particularly with his innovative RGBW image sensor.

Latest Patents

Eun Je Hyun holds a patent for an RGBW image sensor, which includes a binning method in an image sensor and a computer-readable medium for performing the method. This invention provides a unique approach to selecting one or more binning target pixels for each of the red, green, blue, and white pixels in a pixel array. The method generates binning pixel data based on the pixel data corresponding to the selected target pixels and rearranges the pixels to maintain a uniform array pattern.

Career Highlights

Eun Je Hyun is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of image sensor technology. His work has been instrumental in enhancing the performance and efficiency of imaging systems.

Collaborations

He collaborates with talented coworkers, including Jong Min You and Kwang Hyun Lee, who contribute to the innovative projects at Samsung Electronics.

Conclusion

Eun Je Hyun's contributions to the field of image sensors exemplify the spirit of innovation and technological advancement. His work not only enhances imaging technology but also sets the stage for future developments in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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