Company Filing History:
Years Active: 2000-2003
Title: Eun-Hee Shin: Innovator in Plasma Technology
Introduction
Eun-Hee Shin is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of plasma technology, holding a total of 6 patents. His work focuses on improving the efficiency and effectiveness of plasma apparatuses used in various applications.
Latest Patents
One of his latest patents is a method for manufacturing a shield for an inductively-coupled plasma apparatus. This innovative shield is designed to reduce sputter contamination, enhancing the performance of the apparatus. The method involves creating a shield that has multiple openings, strategically placed to correspond with areas between the turns of the coil, which is located outside the process chamber.
Another notable patent is for a plasma process apparatus with in situ monitoring, which includes a monitoring method and a cleaning process for the plasma chamber. This apparatus features a sampling manifold that induces the flow of sample gas from the plasma chamber for analysis. The in situ monitoring method establishes background levels of an initial gas and can initiate cleaning processes to reduce contaminants when necessary.
Career Highlights
Eun-Hee Shin is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of plasma technology. His work has been instrumental in advancing the capabilities of plasma apparatuses, making them more efficient and reliable for various industrial applications.
Collaborations
Eun-Hee has collaborated with notable colleagues, including Sung-bum Cho and Baik-soon Choi, who have contributed to his research and development efforts. Their teamwork has fostered an environment of innovation and creativity within their projects.
Conclusion
Eun-Hee Shin's contributions to plasma technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence advancements in plasma applications, showcasing the importance of innovation in technology.