Eun-Hee Jeang

Title: Eun-Hee Jeang: Innovator in Semiconductor Defect Detection

Introduction

Eun-Hee Jeang is a prominent inventor based in Paju-si, South Korea. She has made significant contributions to the field of semiconductor technology, particularly in the detection of defects on substrates. Her innovative approach has the potential to enhance the manufacturing processes of semiconductor devices.

Latest Patents

Eun-Hee Jeang holds a patent titled "Method of detecting a defect on a substrate, apparatus for performing the same and method of manufacturing semiconductor device using the same." This patent describes a method where an incident beam is radiated onto the surface of a substrate to generate reflected light beams. Among these reflected light beams, a second harmonic generation (SHG) beam can be detected, which is generated by defects on the substrate. This method allows for the detection of nano-sized defects by examining the SHG beam.

Career Highlights

Eun-Hee Jeang is currently employed at Samsung Electronics Co., Ltd., where she continues to work on advancing semiconductor technologies. Her expertise in defect detection has positioned her as a valuable asset in the field.

Collaborations

Eun-Hee has collaborated with notable colleagues, including Aleksandr Shorokhov and Anton Sergeevich Medvedev. These collaborations have further enriched her research and development efforts in semiconductor technology.

Conclusion

Eun-Hee Jeang's innovative work in defect detection for semiconductor substrates showcases her significant contributions to the industry. Her patent and ongoing research at Samsung Electronics Co., Ltd. highlight her role as a leading inventor in this critical field.