This inventor holds 3 USPTO granted patents and 1 EPO patent. Top assignees: Hynix Semiconductor Inc., Lg Display Co., Ltd.. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013
Title: Eun-Ha Lee: Innovator in Substrate Cleaning Technologies
Introduction
Eun-Ha Lee is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in substrate cleaning and pattern formation. With a total of 3 patents, his work has been influential in enhancing manufacturing processes in the semiconductor industry.
Latest Patents
Eun-Ha Lee's latest patents include innovative methods and apparatuses that improve the efficiency and effectiveness of substrate cleaning. One of his patents, titled "Method for forming fine pattern," describes a comprehensive process that involves forming a hard mask layer over an etch target layer, creating a sacrificial layer pattern, and selectively etching the hard mask layer. This method ensures precision in pattern formation across different regions. Another significant patent is the "Apparatus for cleaning substrate," which outlines a cleaning apparatus designed to remove foreign materials from substrates. This apparatus features a substrate entering guide unit, a foreign material removing unit, and a foreign material cleaning unit, all working in tandem to ensure thorough cleaning.
Career Highlights
Eun-Ha Lee has worked with prominent companies in the semiconductor industry, including Hynix Semiconductor Inc. and LG Display Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.
Collaborations
Eun-Ha Lee has collaborated with talented individuals such as Geon-Yong Kim and Eun-Jeong Kim. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the field.
Conclusion
Eun-Ha Lee's contributions to substrate cleaning technologies and pattern formation have established him as a key figure in the semiconductor industry. His innovative patents and collaborations reflect his commitment to advancing technology and improving manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile