Company Filing History:
Years Active: 2010
Title: Eui-Jin Park: Innovator in Plasma Processing Technology
Introduction
Eui-Jin Park is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique structure aimed at preventing gap formation in plasma processing equipment.
Latest Patents
Eui-Jin Park holds 1 patent for his invention titled "Structure for preventing gap formation and plasma processing equipment having the same." This patent describes a plasma processing equipment design that includes a chamber for forming a plasma environment, an upper electrode, an electrostatic chuck with a lower electrode for holding a wafer, a ring surrounding the electrostatic chuck, and a gap prevention unit to isolate the space between the chuck and the ring.
Career Highlights
Eui-Jin Park is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of innovation in technology. His work is instrumental in enhancing the efficiency and effectiveness of plasma processing systems.
Collaborations
Eui-Jin Park has collaborated with talented coworkers, including Yun-Ho Choi and In-Young Park. Their combined expertise contributes to the advancement of their projects and innovations.
Conclusion
Eui-Jin Park's contributions to plasma processing technology exemplify the spirit of innovation. His patent reflects a commitment to improving technological processes in the industry.