The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2010
Filed:
Jan. 09, 2008
Eui-jin Park, Hwaseong-si, KR;
Yun-ho Choi, Yongin-si, KR;
In-young Park, Hwaseong-si, KR;
Hwan-il Jeong, Hwaseong-si, KR;
Sung-sok Choi, Hwaseong-si, KR;
Eui-Jin Park, Hwaseong-si, KR;
Yun-Ho Choi, Yongin-si, KR;
In-Young Park, Hwaseong-si, KR;
Hwan-Il Jeong, Hwaseong-si, KR;
Sung-Sok Choi, Hwaseong-si, KR;
Samsung Electronics Co., Ltd., Suwon-Si, KR;
Abstract
Plasma processing equipment having a structure for preventing gap formation includes: a chamber inside which a plasma environment is formed; an upper electrode positioned at a upper position of the chamber; an electrostatic chuck positioned at a lower position of the electrostatic chuck, having a lower electrode and holding a wafer on a top surface thereof; a ring positioned at an outer side of the electrostatic chuck; and a gap prevention unit for isolating from the outside a space between the electrostatic chuck and the ring.