Moscow, Russia

Eugenia N Zornia

This inventor holds 1 USPTO granted patent. Top assignee: Overseas Publishers Association. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eugenia N Zornia. Retrieved from https://idiyas.com/inventor/eugenia-n-zornia

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Eugenia N Zornia: Innovator in Plasma Jet CVD Technology

Introduction

Eugenia N Zornia is a prominent inventor based in Moscow, Russia. She has made significant contributions to the field of materials science, particularly in the development of advanced methods for depositing diamond and diamond-like films. Her innovative work has garnered attention in both academic and industrial circles.

Latest Patents

Eugenia holds a patent for the "Plasma jet CVD method of depositing diamond or diamond-like films." This patent represents a breakthrough in the technology used for creating high-quality coatings, which have applications in various industries, including electronics and optics. She has 1 patent to her name, showcasing her expertise and dedication to innovation.

Career Highlights

Eugenia is currently affiliated with the Overseas Publishers Association, where she continues to push the boundaries of research and development. Her work has not only advanced the field of material science but has also contributed to the broader understanding of chemical vapor deposition techniques.

Collaborations

Throughout her career, Eugenia has collaborated with notable colleagues, including Pavel P Kulik and Vladimir Vitalevitch Ivanov. These partnerships have enriched her research and have led to further advancements in the technologies she specializes in.

Conclusion

Eugenia N Zornia is a trailblazer in the field of plasma jet CVD technology, with a focus on diamond film deposition. Her contributions and collaborations highlight her role as a key innovator in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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