Hiratsuka, Japan

Etuo Okada

This inventor holds 1 USPTO granted patent. Top assignee: The Yokohama Rubber Co., Ltd.. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Etuo Okada. Retrieved from https://idiyas.com/inventor/etuo-okada

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Etuo Okada

Introduction

Etuo Okada is a notable inventor based in Hiratsuka, Japan. He has made significant contributions to the field of sealant technology. His innovative approach has led to the development of a unique process for preparing one-component type sealants.

Latest Patents

Etuo Okada holds 1 patent for his invention titled "Process for preparing one-component type sealant." This patent describes a method that involves mixing powdery raw materials, such as prepolymer and additives, with a predetermined amount of plasticizer in a hermetically closed system. The process includes continuously degassing the mixed pasty material and subsequently mixing the degassed mixture with a catalyst.

Career Highlights

Etuo Okada is associated with The Yokohama Rubber Co., Ltd., where he has been instrumental in advancing sealant technology. His work has not only contributed to the company's product offerings but has also enhanced the overall quality and efficiency of sealants in various applications.

Collaborations

Etuo Okada has collaborated with notable colleagues, including Koichi Kano and Masamichi Danjo. Their combined expertise has fostered an environment of innovation and creativity within their projects.

Conclusion

Etuo Okada's contributions to sealant technology exemplify the impact of innovative thinking in the industry. His patent and collaborative efforts continue to influence advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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