Tokyo, Japan

Etsurou Okada

This inventor holds 1 USPTO granted patent. Top assignee: M & M, Inc.. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Etsurou Okada. Retrieved from https://idiyas.com/inventor/etsurou-okada

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Etsurou Okada: Innovator in Contact Lens Technology

Introduction

Etsurou Okada is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of optical technology, particularly in the development of cleaning devices for contact lenses. His innovative approach has led to the creation of a patented device that enhances the maintenance and hygiene of contact lenses.

Latest Patents

Etsurou Okada holds a patent for a cleaning device specifically designed for contact lenses. This invention addresses common issues faced by contact lens users, such as cleaning efficiency and lens care. The patent showcases his commitment to improving user experience and safety in contact lens usage. He has 1 patent to his name.

Career Highlights

Throughout his career, Etsurou has worked with M & M, Inc., where he has been instrumental in developing innovative optical solutions. His work has not only advanced the technology behind contact lens care but has also contributed to the overall improvement of eye health for users worldwide.

Collaborations

Due to space constraints, the details of Etsurou Okada's collaborations will not be included.

Conclusion

Etsurou Okada is a pioneering inventor whose work in contact lens technology has made a lasting impact. His dedication to innovation continues to inspire advancements in optical care.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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