Tokyo, Japan

Etsuo Fuduka

This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Toshiba. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Etsuo Fuduka. Retrieved from https://idiyas.com/inventor/etsuo-fuduka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 101(Granted Patents)


Company Filing History:


Years Active: 1996

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Etsuo Fuduka: Innovator in Semiconductor Production

Introduction

Etsuo Fuduka is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor production. His innovative approach has led to the development of a unique system that enhances the efficiency of manufacturing semiconductor products.

Latest Patents

Etsuo Fuduka holds 1 patent for his invention titled "System for automatically producing different semiconductor products." This system includes a section for preparing a process flow that contains a series of processes and conditions for producing various semiconductor products in different quantities. It also features a simulation section that optimizes the production process based on feedback from the simulation results.

Career Highlights

Fuduka is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work at Toshiba has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor technology.

Collaborations

Etsuo Fuduka has collaborated with notable colleagues such as Kazuyki Miura and Masayoshi Tazawa. Their teamwork has fostered an environment of innovation and creativity within the semiconductor industry.

Conclusion

Etsuo Fuduka's contributions to semiconductor production exemplify the impact of innovation in technology. His patented system represents a significant advancement in manufacturing processes, showcasing his expertise and dedication to the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…