Melbourne Beach, FL, United States of America

Etienne Joubert

This inventor holds 1 USPTO granted patent. Top assignee: Inficon Lt Inc.. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Etienne Joubert. Retrieved from https://idiyas.com/inventor/etienne-joubert

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Etienne Joubert: Innovator in Reticle-Induced Error Control

Introduction

Etienne Joubert is a notable inventor based in Melbourne Beach, FL (US). He has made significant contributions to the field of process systems through his innovative patent. His work focuses on methods and systems for controlling reticle-induced errors, which are crucial in various technological applications.

Latest Patents

Etienne Joubert holds a patent titled "Methods and systems for controlling reticle-induced errors." This patent describes systems and methods for managing at least one reticle-induced error in a process system. The systems include adjusting measurement data associated with the process system, based on at least one reticle identifier (ID) and reticle-induced error data. Furthermore, the methods involve combining the adjusted measurement data to compute controls for the process system.

Career Highlights

Etienne Joubert is associated with Inficon Ltd Inc., where he applies his expertise in developing advanced solutions for process control. His innovative approach has led to the creation of effective systems that enhance the accuracy and reliability of process measurements.

Collaborations

Etienne has collaborated with notable colleagues, including Joseph Pellegrini and David A Crow. Their combined efforts contribute to the advancement of technology in their field.

Conclusion

Etienne Joubert's work in controlling reticle-induced errors showcases his innovative spirit and dedication to improving process systems. His contributions are valuable to the industry and highlight the importance of precision in technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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