This inventor holds 4 USPTO granted patents and 1 published patent application, plus 5 CIPO patents and 7 EPO patents. Top assignee: Avery Dennison Corporation. Active years: 2014-2022.
Location History:
- Lincolwood, IL (US) (2017)
- Lincolnwood, IL (US) (2014 - 2022)
Company Filing History:
Years Active: 2014-2022
Title: Ethelbert Galicia: Innovator in Retroreflective Technology
Introduction
Ethelbert Galicia is a notable inventor based in Lincolnwood, IL (US). He has made significant contributions to the field of retroreflective technology, holding a total of 4 patents. His innovative work has paved the way for advancements in the production of tiled articles and molds used for retroreflective applications.
Latest Patents
Galicia's latest patents focus on a tiled retroreflector with multi-stage dicing. The methods he developed include forming a prism array on a master substrate and creating a replica of this master. A reference edge is formed on the replica, which reduces the size of the prism array while maintaining the lateral dimension for ease of handling. The replica is then copied, and the reference edge on the copied tiles is exposed. This allows for the mating and securing of the reference edges face-to-face with other tiles to form a tiled article. These tiled articles can be used as molds to produce retroreflective articles or can be further duplicated to create larger tiled articles for mold use.
Career Highlights
Ethelbert Galicia is currently employed at Avery Dennison Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in enhancing the efficiency and effectiveness of retroreflective products.
Collaborations
Throughout his career, Galicia has collaborated with talented individuals such as Steven R. Chapman and Feng Wu. These partnerships have contributed to the successful development of his patented technologies.
Conclusion
Ethelbert Galicia's contributions to retroreflective technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in creating effective retroreflective solutions.