Tel Aviv, Israel

Ethan James Shiloh


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019-2022

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3 patents (USPTO):Explore Patents

Title: The Innovative Mind of Ethan James Shiloh

Introduction

Ethan James Shiloh is a notable inventor based in Tel Aviv, Israel. He has made significant contributions to the field of radiation protection, particularly in space environments. With a total of 3 patents to his name, Shiloh's work is paving the way for advancements in safety technology.

Latest Patents

One of Shiloh's latest patents is a device and method for protection from radiation in space. This innovative device includes at least one flexible garment designed to shield various regions of the body from harmful radiation. Each section of the garment is specifically configured to attenuate radiation exposure, ensuring that the interior regions of the body are protected to a predefined level. This groundbreaking approach to radiation protection highlights Shiloh's commitment to enhancing safety for individuals in space.

Career Highlights

Ethan James Shiloh is currently associated with Stemrad Ltd., a company dedicated to developing advanced protective technologies. His work at Stemrad has allowed him to focus on innovative solutions that address critical safety challenges in high-risk environments. Shiloh's expertise and dedication have positioned him as a key player in the field of radiation protection.

Collaborations

Throughout his career, Shiloh has collaborated with talented individuals such as Oren Milstein and Gideon Waterman. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Ethan James Shiloh's contributions to radiation protection technology are noteworthy and impactful. His innovative patents and work at Stemrad Ltd. demonstrate his commitment to enhancing safety in challenging environments. As he continues to develop new solutions, Shiloh is sure to leave a lasting mark on the field of invention.

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