Estelle Halary-Wagner

Title: Estelle Halary-Wagner: Innovator in Film Deposition Technology

Introduction

Estelle Halary-Wagner is a prominent inventor based in Ecublens, Switzerland. She has made significant contributions to the field of film deposition technology, particularly through her innovative patent. Her work is characterized by a focus on high vacuum processes that ensure uniform thickness in film deposition.

Latest Patents

Estelle holds a patent titled "Large area deposition in high vacuum with high thickness uniformity." This invention relates to an effusing source for film deposition, which consists of a reservoir with a hole. The unique aspect of her design is that the hole diameter is less than one order of magnitude compared to the mean free path of the molecules, determined by the pressure. Additionally, the thickness of the hole is at least one order of magnitude smaller than its diameter. This innovative approach allows for improved film deposition processes, and she has successfully secured 1 patent for this technology.

Career Highlights

Estelle Halary-Wagner is affiliated with the École Polytechnique Fédérale de Lausanne, a prestigious institution known for its cutting-edge research and innovation. Her role at the university has allowed her to explore and develop her ideas in a collaborative environment, contributing to advancements in her field.

Collaborations

Throughout her career, Estelle has worked alongside talented colleagues, including Giacomo Benvenuti and Simone Amorosi. These collaborations have enriched her research and have led to further innovations in film deposition technology.

Conclusion

Estelle Halary-Wagner is a trailblazer in the realm of film deposition technology, with her patent showcasing her innovative spirit and technical expertise. Her contributions continue to influence the field, and her work at the École Polytechnique Fédérale de Lausanne highlights the importance of collaboration in driving technological advancements.