The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Oct. 24, 2011
Applicants:
Giacomo Benvenuti, Ecublens, CH;
Estelle Halary-wagner, Ecublens, CH;
Simone Amorosi, Ecublens, CH;
Patrik Hoffmann, Epalinges, CH;
Inventors:
Giacomo Benvenuti, Ecublens, CH;
Estelle Halary-Wagner, Ecublens, CH;
Simone Amorosi, Ecublens, CH;
Patrik Hoffmann, Epalinges, CH;
Assignee:
Ecole Polytechnique Federale de Lausanne (EPFL), Lausanne, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/455 (2006.01); H01L 21/306 (2006.01); C30B 23/06 (2006.01); C23C 14/24 (2006.01);
U.S. Cl.
CPC ...
C23C 14/243 (2013.01); C30B 23/066 (2013.01);
Abstract
The invention relates to an effusing source for film deposition made of a reservoir comprising one hole characterized by the fact that the hole diameter is less than one order of magnitude than the mean free path of the molecules determined by the pressure and its thickness is at least one order of magnitude smaller than the diameter. Preferably the source has several holes.