This inventor holds 1 USPTO granted patent. Top assignees: Deutsches Zentrum Fur Luft-Und Raumfahrt E.v., University of Central Florida Research Foundation Inc.. Active years: 2020.
Company Filing History:
1 out of 239 
1 out of 1,368 
Years Active: 2020
Title: Estefania Bohorquez: Innovator in Thermal Barrier Coatings
Introduction
Estefania Bohorquez is a notable inventor based in Orlando, FL (US). She has made significant contributions to the field of thermal barrier coatings, particularly through her innovative patent. Her work focuses on enhancing the durability and performance of coatings used in high-stress environments, such as gas turbines.
Latest Patents
Estefania holds a patent titled "Non-destructive CMAS-infiltration characterization of thermal barrier coatings." This invention provides a non-destructive method for characterizing CMAS infiltration and CMAS-assisted damage in thermal barrier coatings (TBCs). This approach is crucial for determining the lifetime of coatings on turbines and their components, including blades and combustion chamber in-liners. The technology is applicable to both stationary and aviation gas turbines.
Career Highlights
Throughout her career, Estefania has worked with esteemed organizations, including the Deutsches Zentrum für Luft- und Raumfahrt e.V. and the University of Central Florida Research Foundation Inc. Her experience in these institutions has allowed her to develop and refine her innovative ideas in thermal barrier coatings.
Collaborations
Estefania has collaborated with notable professionals in her field, including Uwe Schulz and Seetha Raghavan. These partnerships have contributed to her research and the successful development of her patent.
Conclusion
Estefania Bohorquez is a pioneering inventor whose work in thermal barrier coatings has the potential to significantly impact the longevity and efficiency of turbine technologies. Her innovative approach and dedication to her field make her a valuable contributor to advancements in engineering and materials science.