Furth, Germany

Eser Alper Unal

This inventor holds 2 USPTO granted patents, plus 1 CIPO patent. Top assignees: Leonhard Kurz Stiftung & Co Kg, Ovd Kinegram Ag. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eser Alper Unal. Retrieved from https://idiyas.com/inventor/eser-alper-unal

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 50.0


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2021

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2 patents (USPTO):Explore Patents

Title: Eser Alper Unal: Innovator in Thermal Transfer Technology

Introduction

Eser Alper Unal is a notable inventor based in Furth, Germany. He has made significant contributions to the field of thermal transfer technology, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

Unal's latest patents include a thermal transfer foil designed for producing a true color image. This process involves a thermal transfer foil that incorporates at least one effect pigment layer and a carrier foil containing first effect pigments in one or more first regions. Additionally, he has developed a method for producing a multilayer body, which outlines specific steps for creating this advanced material.

Career Highlights

Throughout his career, Eser Alper Unal has worked with prominent companies such as Leonhard Kurz Stiftung & Co. KG and OVD Kinegram AG. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking projects in the field of imaging and materials.

Collaborations

Unal has collaborated with notable professionals in his field, including Harald Walter and Ludwig Brehm. These partnerships have further enhanced his work and innovation in thermal transfer technologies.

Conclusion

Eser Alper Unal's contributions to thermal transfer technology and his innovative patents reflect his dedication to advancing the field. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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