Location History:
- FL-949 L Eschen, LI (1980)
- Eschen, LI (1982 - 1983)
Company Filing History:
Years Active: 1980-1983
Title: Ernst W. Loebach: Innovator in Projection Mask Technology
Introduction
Ernst W. Loebach, an accomplished inventor based in Eschen, Liechtenstein, has made significant contributions to the field of projection mask technology. With three patents to his name, Loebach's work focuses primarily on methods and apparatuses that enhance the precision and efficiency of projection printing systems.
Latest Patents
Loebach's latest innovations include a groundbreaking projection mask and the accompanying method and apparatus for its production. This projection mask consists of a substrate adorned with a mask, overlaid with a cover glass that seals the mask's peripheral edges. A particle-free fluid occupies the defined space between the substrate and the cover glass, allowing for optimal performance in projection printing systems. Furthermore, his patented method for projection printing involves aligning masks onto a wafer that is coated with a photosensitive layer. This method employs imaging alignment patterns, utilizing alignment light composed of at least two narrow wavelength ranges. This sophisticated approach ensures a high-intensity, high-contrast alignment signal, facilitating accurate printing on the workpiece.
Career Highlights
Throughout his career, Ernst W. Loebach has been associated with notable organizations, including Censor Patent- und Versuchsanstalt. His expertise has contributed to the advancement of technologies that are critical in the production of high-resolution images on wafers.
Collaborations
In his professional journey, Loebach has collaborated with distinguished colleagues, including Harry L. Sawatzki and Herbert E. Mayer. Together, they have worked on various projects that push the boundaries of conventional printing technologies, underscoring the importance of teamwork in driving innovation.
Conclusion
Ernst W. Loebach's innovations in projection mask technology represent a significant leap in the field of photolithography, reflecting his commitment to enhancing production methods. With his three patents, he remains a key figure in the realm of high-tech manufacturing, paving the way for future advancements in the industry.