Hamburg, Germany

Ernst Lukat

This inventor holds 1 USPTO granted patent. Top assignee: Beiersdorf Ag. Active years: 1979.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ernst Lukat. Retrieved from https://idiyas.com/inventor/ernst-lukat

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1979

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1 patent (USPTO):Explore Patents

Title: Ernst Lukat: Innovator in Self-Adhesive Compositions

Introduction

Ernst Lukat is a notable inventor based in Hamburg, Germany. He has made significant contributions to the field of self-adhesive compositions, particularly through his innovative patent.

Latest Patents

Lukat holds a patent for an "Acrylic and methacrylic self-adhesive composition and radiation method." This self-adhesive composition comprises a crosslinked copolymer of 0.01 to 5% by weight based on said composition of a compound taken from the class consisting of acrylic and methacrylic-[(2-alkoxy-2-phenyl-2-benzoyl) ethyl] esters and at least one monomer capable of producing a self-adhesive polymer. The patent also discloses a method of preparation for this composition.

Career Highlights

Ernst Lukat is associated with Beiersdorf AG, a leading company in the consumer goods sector. His work has focused on developing advanced adhesive technologies that enhance product performance and usability.

Collaborations

Lukat has collaborated with notable colleagues, including Wolfdieter Lenck and Peter Jauchen. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Ernst Lukat's innovative work in self-adhesive compositions exemplifies the impact of dedicated inventors in advancing technology. His contributions continue to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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