Company Filing History:
Years Active: 2007
Title: Innovations by Ernesto L Vargas in Plasma Technology
Introduction
Ernesto L Vargas is a notable inventor based in San Diego, CA, who has made significant contributions to the field of plasma technology. With a focus on enhancing the efficiency and safety of extreme ultraviolet (EUV) light sources, Vargas has developed innovative systems that protect internal components from harmful ions.
Latest Patents
Vargas holds a patent for "Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source." This patent outlines a system designed to safeguard internal components from ions generated at a plasma formation site. The system includes a plurality of foil plates and a mechanism for generating a magnetic field to deflect ions onto the surfaces of these plates. Additionally, it features an electrostatic grid that interacts with ions to reduce their energy, ensuring that they do not strike the internal components. The resonant frequency of the grid is tuned to optimize the timing between the arrival of electrons and ions, further enhancing the system's effectiveness.
Career Highlights
Vargas is currently employed at Cymer, Inc., a company renowned for its advancements in photolithography technology. His work at Cymer has positioned him as a key player in the development of EUV light sources, which are critical for the semiconductor manufacturing industry. With a patent portfolio that includes one patent, Vargas continues to push the boundaries of innovation in his field.
Collaborations
Throughout his career, Vargas has collaborated with esteemed colleagues such as Curtis L Rettig and Jerzy R Hoffman. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Ernesto L Vargas exemplifies the spirit of innovation in plasma technology, with his patent addressing critical challenges in the protection of EUV light sources. His contributions at Cymer, Inc. and collaborations with fellow inventors highlight his commitment to advancing the field. The impact of his work is significant, paving the way for future developments in semiconductor manufacturing.