Eriko Toshimitsu

Title: Eriko Toshimitsu: Innovator in Lithographic Printing Technology

Introduction

Eriko Toshimitsu is a notable inventor based in Kanagawa, Japan. She has made significant contributions to the field of lithographic printing technology. With a total of 2 patents to her name, her work has advanced the methods used in this industry.

Latest Patents

Toshimitsu's latest patents focus on a method for treating photosensitive lithographic printing plates. This innovative method involves exposing the photosensitive lithographic printing plate to laser light, followed by development with a developer containing an alkali metal silicate. The process also includes a post-exposure treatment. The photosensitive lithographic printing plate is prepared by forming a photopolymerizable photosensitive layer with a film thickness ranging from 1.2 to 4 g/m. Additionally, a protective layer is formed with a film thickness of 2 to 8 g/m on a support that has a centerline average height (Ra) of at least 0.35 µm.

Career Highlights

Throughout her career, Eriko Toshimitsu has worked with prominent companies such as Mitsubishi Chemical Corporation and Lastra S.p.a. Her experience in these organizations has contributed to her expertise in lithographic printing technology.

Collaborations

One of her notable collaborators is Hideaki Okamoto. Their partnership has likely fostered innovative ideas and advancements in their field.

Conclusion

Eriko Toshimitsu's contributions to lithographic printing technology through her patents and career experiences highlight her as a significant figure in the industry. Her innovative methods continue to influence the development of printing technologies.