Ebina, Japan

Eriko Nakajima

This inventor holds 1 USPTO granted patent. Top assignee: Adtec Engineering Co., Ltd.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eriko Nakajima. Retrieved from https://idiyas.com/inventor/eriko-nakajima

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Eriko Nakajima: Innovator in Pattern Drawing Technology

Introduction

Eriko Nakajima is a prominent inventor based in Ebina, Japan. She has made significant contributions to the field of pattern drawing technology. Her innovative work has led to the development of a unique apparatus that enhances precision in pattern drawing.

Latest Patents

Eriko Nakajima holds 1 patent for her invention titled "Pattern drawing apparatus and pattern drawing method." This patent describes a sophisticated apparatus that includes a first image-pickup device for reading an alignment mark and a first pattern image to detect positional shifts. Additionally, it features a second image-pickup device for reading both the first and second pattern images, allowing for accurate detection of positional shifts during the drawing process.

Career Highlights

Eriko Nakajima is currently associated with Adtec Engineering Co., Ltd., where she continues to innovate and develop advanced technologies. Her work has been instrumental in improving the efficiency and accuracy of pattern drawing methods used in various applications.

Collaborations

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Conclusion

Eriko Nakajima's contributions to pattern drawing technology exemplify her dedication to innovation and excellence in her field. Her patent reflects her commitment to advancing technology and improving processes in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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