Yokohama, Japan

Eriko Kimura


Average Co-Inventor Count = 4.7

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1999-2017

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5 patents (USPTO):Explore Patents

Title: The Innovative Mind of Eriko Kimura

Introduction

Eriko Kimura is an accomplished inventor based in Yokohama, Japan, with a remarkable portfolio of five patents to her name. Her contributions primarily focus on advancements in deposition technology, which are crucial for the production of thin film patterns utilized in various electronic applications.

Latest Patents

One of her latest patents is a deposition mask designed for forming a thin film pattern with a predetermined shape on a substrate through deposition. This innovative mask includes a resin film that transmits visible light, incorporating an opening pattern that penetrates through the resin. The pattern matches the dimensions and shape of the desired thin film, aligning perfectly with the designated forming region on the substrate. This invention demonstrates her expertise in enhancing the precision of deposition processes.

Career Highlights

Throughout her career, Eriko Kimura has made significant strides in the field of technology while working at prominent companies such as V Technology Co., Ltd. and Nissan Motor Company Limited. Her roles in these organizations have allowed her to contribute to various cutting-edge projects, solidifying her reputation as a leading inventor in her field.

Collaborations

During her professional journey, Eriko has collaborated with notable individuals in the industry, including Shigeto Sugimoto and Koichi Kajiyama. These partnerships have fostered innovative thinking and have been instrumental in the development of her patented technologies.

Conclusion

Eriko Kimura exemplifies the spirit of innovation through her dedication to advancing technology in the realm of thin film deposition. Her five patents reflect her ingenuity and commitment, paving the way for future innovations in electronics and materials science. Her work will undoubtedly continue to inspire aspiring inventors and contribute to the evolving landscape of technology.

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