Tennenlohe, Germany

Erik Sippel

This inventor holds 1 USPTO granted patent and 3 published patent applications and 1 EPO patent. Top assignee: Friedrich-Alexander-Universitat Erlangen-Nürnberg. Active years: 2023.

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Erik Sippel

Introduction

Erik Sippel is a notable inventor based in Tennenlohe, Germany. He has made significant contributions to the field of localization technology, particularly through his innovative patent. His work focuses on utilizing wave-based signals for the precise localization of objects.

Latest Patents

Erik Sippel holds a patent for a "Locating method for localizing at least one object using wave-based signals and locating system." This invention relates to a method that employs a wave field emanating from the object to be localized. The wave field is received by multiple receivers, which form measurement signals based on the spatial and temporal distribution of the wave field. The current position of the object is determined by comparing measured phase values with hypothetical phase values, utilizing a recursive filter/estimator.

Career Highlights

Erik Sippel is affiliated with Friedrich-Alexander-Universität Erlangen-Nürnberg, where he contributes to research and development in localization technologies. His work has garnered attention for its innovative approach to solving complex localization challenges.

Collaborations

Erik collaborates with talented individuals such as Melanie Lipka and Martin Vossiek, who share his passion for advancing technology in the field of localization.

Conclusion

Erik Sippel's contributions to the field of localization through his innovative patent demonstrate his expertise and commitment to advancing technology. His work continues to influence the way objects are localized using wave-based signals.

Profile summary based on public USPTO records.
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