Benningen, Germany

Erik Mueller

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Pall Corporation. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Erik Mueller. Retrieved from https://idiyas.com/inventor/erik-mueller-rnt6ysbq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: The Innovations of Erik Mueller

Introduction

Erik Mueller is a notable inventor based in Benningen, Germany. He has made significant contributions to the field of filament production technology. His innovative work has led to the development of a unique device that enhances the production of hollow fiber membranes.

Latest Patents

Erik holds 1 patent for his invention titled "Filament production device." This device is designed to produce filaments formed as hollow fiber membranes from a polymer solution. It features a spinning nozzle unit that facilitates the production process and a polymerization unit that initiates the polymerization of the solution, partially within the spinning nozzle unit.

Career Highlights

Erik Mueller is currently employed at Pall Corporation, where he continues to advance his research and development efforts. His work at Pall Corporation has positioned him as a key player in the field of polymer technology.

Collaborations

Throughout his career, Erik has collaborated with talented individuals such as Dietmar Oechsle and Christian Dahlberg. These partnerships have fostered innovation and contributed to the success of his projects.

Conclusion

Erik Mueller's contributions to filament production technology exemplify the spirit of innovation. His patent and ongoing work at Pall Corporation highlight his commitment to advancing the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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