Danderyd, Sweden

Erik Ljungzell

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Tobii Ab. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Erik Ljungzell. Retrieved from https://idiyas.com/inventor/erik-ljungzell

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Erik Ljungzell

Introduction

Erik Ljungzell is a notable inventor based in Danderyd, Sweden. He has made significant contributions to the field of eye tracking technology. His innovative approach has led to the development of a unique eye tracking system that addresses specific challenges in image processing.

Latest Patents

Erik holds a patent for an eye tracking system that detects and removes problematic blobs in captured images. This system is designed to enhance the accuracy of eye tracking by switching off illuminators that may obscure the user's pupil. The process involves using multiple criteria to identify and eliminate these blobs, ensuring clearer images for analysis.

Career Highlights

Erik Ljungzell is currently employed at Tobii AB, a company renowned for its advancements in eye tracking technology. His work at Tobii has positioned him as a key player in the development of innovative solutions that improve user experience in various applications.

Collaborations

Erik collaborates with talented individuals such as Viktor Wase and Mark Ryan, who contribute to the innovative environment at Tobii AB. Their combined expertise fosters a culture of creativity and technological advancement.

Conclusion

Erik Ljungzell's contributions to eye tracking technology exemplify the impact of innovation in enhancing user interaction with digital systems. His work continues to pave the way for future advancements in this exciting field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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