Ashington, United Kingdom

Erik J H Collart


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2005-2009

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2 patents (USPTO):Explore Patents

Title: The Innovations of Inventor Erik J H Collart

Introduction

Erik J H Collart is a prominent inventor based in Ashington, GB. With a total of two patents to his name, Collart has made significant contributions to the field of ion implantation technology through his innovative ideas and designs.

Latest Patents

Collart's latest inventions focus on enhancing the efficiency of ion sources used in ion implantation apparatus. Specifically, his work addresses the issue of heat loss from the ion source. He proposes a solution that involves lining the interior and/or exterior of the ion chamber with heat-reflective and heat-insulating materials. Additionally, he introduces an indirectly heated cathode tube designed to minimize heat transfer along the tube, achieved through the formation of slits in the tube. To further improve the ion source's efficiency, the front plate of the ion chamber is impregnated or coated with materials that contain elements or compounds corresponding to the ions intended for implantation into substrates.

Career Highlights

Collart is associated with Applied Materials, Inc., a company known for its advanced technologies in the semiconductor, display, and solar industries. His work there emphasizes the significance of innovation in improving manufacturing processes and the performance of ion implantation equipment.

Collaborations

Throughout his career, Collart has collaborated with notable colleagues, including Adrian John Murrell and Richard David Goldberg. These collaborations have likely enriched his work and contributed to the development of cutting-edge technologies in the field.

Conclusion

Erik J H Collart stands out as an inventor dedicated to advancing ion implantation technology. His innovative patents and collaboration with industry professionals reflect his commitment to enhancing efficiency in this critical area of semiconductor manufacturing.

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