Location History:
- Chittenden County, VT (US) (1996)
- Colchester, VT (US) (2001 - 2003)
Company Filing History:
Years Active: 1996-2003
Title: The Innovations of Erik A Puttlitz
Introduction
Erik A Puttlitz is a notable inventor based in Colchester, VT (US). He has made significant contributions to the field of photoresist technology, holding a total of 3 patents. His work focuses on enhancing the performance of photoresists, which are crucial in various applications, particularly in semiconductor manufacturing.
Latest Patents
One of Erik's latest patents is titled "Controlled aging of photoresists for faster photospeed." This innovative method allows for the controlled aging of a photoresist, resulting in an aged photoresist that achieves a targeted photospeed faster than that of a conventional unaged photoresist. The process involves aging a solution containing a photoresist resin composition at a temperature below its thermal decomposition, but not below 20°C, for a time period effective in achieving the desired photospeed. Another significant patent is "Mask with attenuating phase-shift and opaque regions," which further showcases his expertise in the field.
Career Highlights
Erik A Puttlitz is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and develop new technologies. His work at IBM has allowed him to collaborate with some of the brightest minds in the industry, contributing to advancements in photoresist applications.
Collaborations
Some of Erik's notable coworkers include William John Adair and James J Colelli. Their collaborative efforts have played a vital role in the development of cutting-edge technologies in the field.
Conclusion
Erik A Puttlitz's contributions to the field of photoresist technology are significant and impactful. His innovative patents and work at IBM highlight his dedication to advancing technology in this critical area.