St. Gallen, Switzerland

Erich Sutter

This inventor holds 2 USPTO granted patents and 3 EPO patents. Top assignee: Gema Switzerland Gmbh. Active years: 2025.


% Patents Active = 100.0

 

Average Co-Inventor Count = 2.4

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
Loading Chart...
2 patents (USPTO):Explore Patents

Title: Erich Sutter: Innovator in Powder Conveying Technology

Introduction

Erich Sutter is a notable inventor based in St. Gallen, Switzerland. He has made significant contributions to the field of powder conveying technology, holding 2 patents that showcase his innovative approach to solving industry challenges.

Latest Patents

One of his latest patents is a dense-phase powder pump designed for conveying powder-type materials. This invention features a powder conveying chamber equipped with a gas-permeable filter element and a pinch valve that connects to the end region of the chamber. The design includes a pinch valve housing that serves as the end piece of the powder conveying chamber, allowing for efficient connection and operation. Another patent focuses on a powder conveying chamber that fluidically connects to a powder line, designed to reduce the effective flow cross-section and includes a cleaning system to maintain the chamber free of powder deposits.

Career Highlights

Erich Sutter is currently employed at Gema Switzerland GmbH, where he continues to develop innovative solutions in powder technology. His work has significantly impacted the efficiency and effectiveness of powder conveying systems in various applications.

Collaborations

Erich collaborates with talented coworkers, including Marco Sanwald and Hanspeter Michael, who contribute to the innovative environment at Gema Switzerland GmbH.

Conclusion

Erich Sutter's contributions to powder conveying technology through his patents and work at Gema Switzerland GmbH highlight his role as a key innovator in the industry. His inventions continue to advance the field and improve operational efficiencies.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…