Company Filing History:
Years Active: 2018-2022
Title: Innovations by Erica Ann Douglas
Introduction
Erica Ann Douglas is a prominent inventor based in Albuquerque, NM (US). She has made significant contributions to the field of semiconductor technology, holding a total of six patents. Her work focuses on enhancing the performance and efficiency of materials used in electronic devices.
Latest Patents
One of her latest patents is titled "Metal stack templates for suppressing secondary grains in ScAlN." This invention discloses a metal stack designed for templating the growth of AlN and ScAlN films. The metal stack comprises one, two, or three layers of metal, each compatible with CMOS post-processing. It promotes the growth of highly textured c-axis {002} AlN and ScAlN films, resulting in improved piezoelectric properties. Another notable patent is "ScAlN etch mask for highly selective etching." This fabrication process utilizes ScAlN as an etch mask, which is chemically nonvolatile in fluorine-based etch chemistries. The ScAlN etch mask demonstrates exceptional selectivity and reduced surface roughness compared to traditional AlN etch masks.
Career Highlights
Erica Ann Douglas is currently employed at National Technology & Engineering Solutions of Sandia, LLC. Her innovative work has positioned her as a leader in her field, contributing to advancements in semiconductor materials and processes.
Collaborations
She has collaborated with notable colleagues, including Michael David Henry and Albert G Baca, further enhancing the impact of her research and inventions.
Conclusion
Erica Ann Douglas exemplifies the spirit of innovation in semiconductor technology through her patents and contributions. Her work continues to influence the development of advanced materials for electronic applications.