Eric V Johnstone

Title: Eric V Johnstone: Innovator in Photomask Technology

Introduction

Eric V Johnstone is a notable inventor based in Round Rock, Texas. He has made significant contributions to the field of photomask technology, particularly through his innovative patent. His work has implications for various applications in the semiconductor industry.

Latest Patents

Eric V Johnstone holds a patent for a "Multi-tone photomask and method for manufacturing the same." This patent discloses a photomask that includes a filter layer formed on at least a portion of a substrate. The filter layer features a first pattern created by a first etch process. Additionally, a barrier layer containing the first pattern is formed on at least a portion of the filter layer through a second etch process. An absorber layer, which includes a second pattern, is then formed on at least a portion of the barrier layer via a third etch process. Notably, the barrier layer serves as an etch stop for the third etch process.

Career Highlights

Eric is associated with Dupont Photomasks, Inc., where he has been instrumental in advancing photomask technology. His expertise and innovative approach have contributed to the company's reputation in the industry.

Collaborations

Eric has worked alongside Franklin Dean Kalk, collaborating on various projects that enhance the capabilities of photomask technology.

Conclusion

Eric V Johnstone's contributions to the field of photomask technology through his patent and work at Dupont Photomasks, Inc. highlight his role as an innovator in the industry. His advancements continue to influence the semiconductor sector.