Eric H Johnson

Title: Eric H Johnson: Innovator in Photolithography Technology

Introduction

Eric H Johnson is a notable inventor based in Cumberland Center, ME (US). He has made significant contributions to the field of photolithography, particularly in addressing challenges associated with severe structure topologies. His innovative approach has led to advancements that are crucial for various applications, including micro-electro mechanical systems.

Latest Patents

Eric H Johnson holds 1 patent for his invention titled "System to enable photolithography on severe structure topologies." This patent describes a system and related process that enables control of photolithographic pattern features on structures with severe non-flat topologies. The system involves analyzing the Depth of Focus associated with photolithographic equipment and a photoresist film applied to the structure. Based on this analysis, a range of layout dimensions for the topologies is identified and incorporated into the fabrication process. A conformal layer of material is then applied to the formed structure, effectively closing up the topologies before the application of the photoresist film. This system is particularly suitable for structures with severe topologies and photolithographic limitations.

Career Highlights

Eric H Johnson is currently employed at Fairchild Semiconductor Corporation, where he continues to work on innovative solutions in semiconductor technology. His expertise in photolithography has positioned him as a valuable asset in the field.

Collaborations

Eric has collaborated with Michael Harley-Stead, contributing to the development of advanced technologies in their respective areas of expertise.

Conclusion

Eric H Johnson's work in photolithography represents a significant advancement in the field, particularly for applications involving complex topologies. His innovative patent and ongoing contributions at Fairchild Semiconductor Corporation highlight his role as a key inventor in this technology.