Eric Calvin Hansen

Title: Eric Calvin Hansen: Innovator in Photoresist Technology

Introduction

Eric Calvin Hansen is a notable inventor based in San Jose, CA (US). He has made significant contributions to the field of photoresist technology, holding 2 patents that showcase his innovative approaches.

Latest Patents

Hansen's latest patents include "Photoresist with multiple patterning radiation-absorbing elements and/or vertical composition gradient." This patent relates to techniques for depositing photoresist material on a substrate. The methods involve providing a substrate in a reaction chamber and using an organo-metallic precursor that has a high patterning radiation-absorption cross-section. The photoresist material may contain multiple high-patterning radiation absorbing elements or a composition gradient along its thickness.

Another significant patent is "Photoresist development with organic vapor." This invention focuses on the development of resists to form a patterning mask for high-resolution patterning. The development process can utilize organic vapors, such as trifluoroacetic acid or hexafluoro-acetylacetone, to develop a metal-containing resist film on a semiconductor substrate.

Career Highlights

Eric Calvin Hansen is currently employed at Lam Research Corporation, where he continues to advance his research in photoresist technologies. His work has been instrumental in enhancing the capabilities of semiconductor manufacturing processes.

Collaborations

Hansen has collaborated with notable colleagues, including Timothy William Weidman and Chenghao Wu, contributing to various projects within the field.

Conclusion

Eric Calvin Hansen's innovative work in photoresist technology has made a significant impact on the semiconductor industry. His patents reflect a commitment to advancing the field and improving manufacturing techniques.