Eri Okazaki

Title: Eri Okazaki: Innovator in Conductive Pattern Manufacturing

Introduction

Eri Okazaki is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of conductive materials, holding three patents that showcase her innovative approaches to manufacturing and material science.

Latest Patents

One of her latest patents is a method for manufacturing conductive patterns and a conductive pattern formed substrate. This invention allows for the easy achievement of narrow pitches in conductive patterns. The process involves forming a metal nanowire layer on a substrate and using pulsed light through a mask to sinter the metal nanowires, resulting in a substrate with a conductive pattern that can be produced through simple steps. Another notable patent is for producing metal nanowires and silver nanowires. This method enables the production of long and thin metal nanowires by preparing a specific solution and controlling the reaction time based on ultraviolet-visible absorption spectrum changes.

Career Highlights

Eri Okazaki has worked with notable organizations such as Showa Denko K.K. and Osaka University. Her experience in these institutions has contributed to her expertise in material science and innovation.

Collaborations

Throughout her career, Eri has collaborated with esteemed colleagues, including Hiroshi Uchida and Hideki Ohata. These partnerships have further enhanced her research and development efforts in the field.

Conclusion

Eri Okazaki is a trailblazer in the realm of conductive materials, with her patents reflecting her innovative spirit and technical expertise. Her work continues to influence advancements in manufacturing techniques and material applications.