The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2019
Filed:
Apr. 17, 2014
Showa Denko K.k., Tokyo, JP;
Hiroshi Uchida, Tokyo, JP;
Kenji Shinozaki, Tokyo, JP;
Eri Okazaki, Tokyo, JP;
Hideki Ohata, Tokyo, JP;
Yasunao Miyamura, Tokyo, JP;
SHOWA DENKO K.K., Minato-ku, Tokyo, JP;
Abstract
Provided are a conductive pattern manufacturing method and a conductive pattern formed substrate, capable of easily achieving a narrow pitch. A metal nanowire layeris formed on the entirety of a part of at least one of the main faces of a substrate, pulsed light is irradiated thereto through a maskprovided with a light transmission portionformed in a predetermined pattern, and the metal nanowires in the metal nanowire layerat the region having the above predetermined pattern were sintered, to thereby obtain conductivity at the predetermined patterned region. Accordingly, a substrate provided with a conductive pattern having any selected pattern can be produced by simple steps.