Ibaraki, Japan

Eri Komatsumoto

This inventor holds 1 USPTO granted patent. Top assignee: Canon Kabushiki Kaisha. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eri Komatsumoto. Retrieved from https://idiyas.com/inventor/eri-komatsumoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Eri Komatsumoto: Innovator in Negative-Chargeability Control Resin

Introduction

Eri Komatsumoto is a notable inventor based in Ibaraki, Japan. She has made significant contributions to the field of materials science, particularly in the development of innovative resins. Her work focuses on enhancing the performance of toners used in various applications.

Latest Patents

Eri Komatsumoto holds 1 patent for her invention of a negative-chargeability control resin. This resin contains a specific vinyl copolymer that imparts stable chargeability to toner. The vinyl copolymer is synthesized by copolymerizing a monomer composition that includes various vinyl monomers, ensuring optimal performance in toner applications.

Career Highlights

Eri Komatsumoto is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and printing technologies. Her role involves research and development, where she applies her expertise to create advanced materials that enhance product performance.

Collaborations

Eri collaborates with her coworker, Tatsurou Yoshida, who contributes to their joint efforts in research and development. Together, they work on innovative projects that push the boundaries of material science.

Conclusion

Eri Komatsumoto's contributions to the field of negative-chargeability control resins exemplify her dedication to innovation. Her work at Canon Kabushiki Kaisha continues to influence advancements in toner technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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