Moerfelden-Walldorf, Germany

Erhard Stein

This inventor holds 1 USPTO granted patent. Top assignee: Daimler-Benz Ag. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Erhard Stein. Retrieved from https://idiyas.com/inventor/erhard-stein

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: Erhard Stein

Introduction: Erhard Stein is a notable inventor based in Morfelden-Walldorf, Germany. With a passion for technology and innovation, he has made significant contributions in the field of semiconductor structures. His inventive spirit is exemplified through his patented technology, which showcases his dedication to advancing modern engineering.

Latest Patents: Erhard Stein holds one patent for a "Semiconductor structure having one or more lateral, high-blocking". This innovation represents a sophisticated approach to semiconductor technology, aiming to enhance the efficiency and performance of electronic devices.

Career Highlights: Currently, Erhard Stein is employed at Daimler-Benz AG, where he continues to push the boundaries of technology. His role at such a prominent company has allowed him to contribute significantly to advancements in automotive and electronic systems.

Collaborations: Throughout his career, Stein has worked alongside talented colleagues in the field. Notable among his collaborators are Wolfgang Wondrak and Raban Held. Together, they have fostered an environment of innovation and creativity, driving forward exciting projects in semiconductor technology.

Conclusion: Erhard Stein exemplifies the spirit of innovation that drives technological progress. With his patented work in semiconductors and collaboration with esteemed colleagues, he is a key figure in his field. His efforts not only contribute to his company’s success but also enhance the technological landscape for future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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