Modiin, Israel

Eran Mutai

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Scodix Ltd.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eran Mutai. Retrieved from https://idiyas.com/inventor/eran-mutai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Eran Mutai: Innovator in Print Technology

Introduction

Eran Mutai is a notable inventor based in Modiin, Israel. He has made significant contributions to the field of print technology, particularly through his innovative patent that enhances the application of topping materials to print products.

Latest Patents

Eran Mutai holds a patent titled "System and method to apply topping materials to print products." This patent discloses systems and methods that include a process for depositing a curable adhesive onto a substrate's surface in a predetermined pattern. The method further involves placing topping material onto the substrate with the deposited adhesive and applying UV energy to cure the adhesive.

Career Highlights

Eran is currently employed at Scodix Ltd., a company known for its advancements in digital printing technology. His work at Scodix has allowed him to explore innovative solutions that improve print quality and efficiency.

Collaborations

Eran has collaborated with talented individuals such as Eli Grinberg and Amir Osadon, contributing to a dynamic work environment that fosters creativity and innovation.

Conclusion

Eran Mutai's contributions to print technology through his patent and work at Scodix Ltd. highlight his role as an influential inventor in the industry. His innovative methods are paving the way for advancements in print applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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