Suwon, South Korea

Eon Ju Noh

This inventor holds 3 USPTO granted patents. Top assignees: Samsung Electro-Mechanics, Samsung Electro-Mechanics Co., Ltd.. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eon Ju Noh. Retrieved from https://idiyas.com/inventor/eon-ju-noh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.3

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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3 patents (USPTO):Explore Patents

Title: Eon Ju Noh: Innovator in Electronic Components

Introduction

Eon Ju Noh is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of electronic components, holding a total of 3 patents. His innovative work has been instrumental in advancing technology in this sector.

Latest Patents

One of Eon Ju Noh's latest patents is for a multilayer electronic component. This electronic component features a body that includes a dielectric layer and an internal electrode. Additionally, it has an external electrode that is connected to the internal electrode and includes a low-reflection layer. Notably, the brightness of the surface of the low-reflection layer is lower than that of the body, enhancing its functionality.

Career Highlights

Eon Ju Noh has had a successful career, working with notable companies such as Samsung Electro-Mechanics. His experience in these organizations has allowed him to develop and refine his innovative ideas in electronic components.

Collaborations

Throughout his career, Eon Ju Noh has collaborated with talented individuals, including Ho In Jun and Kyeong Jun Kim. These collaborations have contributed to the success of his projects and patents.

Conclusion

Eon Ju Noh is a distinguished inventor whose work in electronic components has led to several patents and advancements in technology. His contributions continue to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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