This inventor holds 1 USPTO granted patent. Top assignee: Tsinghua University. Active years: 2021.
Company Filing History:
Years Active: 2021
Title: Enyao Shang: Innovator in Laser Displacement Measurement Systems
Introduction
Enyao Shang is a prominent inventor based in Beijing, China. He has made significant contributions to the field of laser displacement measurement systems. His innovative approach addresses critical challenges in the calibration of interferometers.
Latest Patents
Enyao Shang holds a patent for a method titled "Method for calibrating an error of installation of an interferometer in a multi-axis laser displacement measurement system." This patent outlines a technique that involves adding one or more redundant interferometers to a laser interferometer displacement measurement system. The method establishes displacement calculating equations that incorporate installation errors and allows for the continuous measurement of displacement information at multiple points. By solving the equation set, the installation error of the interferometer can be accurately determined. This self-calibration method effectively resolves the difficulties associated with calibrating multi-axis interferometers in industrial applications without relying on other high-precision displacement sensors. He has 1 patent to his name.
Career Highlights
Enyao Shang is affiliated with Tsinghua University, a prestigious institution known for its research and innovation. His work at the university has positioned him as a key figure in advancing laser measurement technologies.
Collaborations
He has collaborated with notable colleagues, including Yu Zhu and Jinchun Hu, contributing to various research projects and innovations in the field.
Conclusion
Enyao Shang's contributions to laser displacement measurement systems exemplify the impact of innovative thinking in engineering. His patented method for calibrating interferometers showcases his commitment to solving complex industrial challenges.