Providence, RI, United States of America

Enqin Eunice Png

This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Moonrise Sisters, Inc.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Enqin Eunice Png. Retrieved from https://idiyas.com/inventor/enqin-eunice-png

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Enqin Eunice Png: Innovator in Protective Garments

Introduction

Enqin Eunice Png is a notable inventor based in Providence, RI (US). She has made significant contributions to the field of protective garments, focusing on the intersection of comfort and functionality. Her innovative approach has led to the development of unique fabrics that enhance the wearer's experience.

Latest Patents

Enqin holds a patent for "Fabric, protective garments made therefrom, and methods of making." This patent discloses protective garments that feature an inner surface with both absorbent and stain-resistant properties. These garments maintain the soft feel, breathability, and aesthetic qualities associated with traditional intimate apparel, making them both practical and appealing.

Career Highlights

Enqin is currently associated with Moonrise Sisters, Inc., where she continues to push the boundaries of garment technology. Her work emphasizes the importance of creating protective clothing that does not compromise on comfort or style.

Collaborations

Enqin has collaborated with talented individuals such as Julie M Sygiel and Daniel M Wyner, contributing to a dynamic work environment that fosters innovation.

Conclusion

Enqin Eunice Png's contributions to the field of protective garments exemplify her commitment to innovation and quality. Her work not only enhances the functionality of clothing but also ensures that wearers enjoy comfort and style.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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