Enning Zhang

Title: Enning Zhang: Innovator in Semiconductor Technology

Introduction

Enning Zhang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent. His work focuses on improving semiconductor structures and their fabrication methods.

Latest Patents

Enning Zhang holds a patent for a semiconductor structure and fabrication method. This patent outlines a method that includes providing a substrate, forming a stacked material structure on the substrate, and creating trenches in the stacked material structure. The trenches are arranged along a specific direction and form an initial stacked structure that includes multiple layers. The method also involves etching and removing portions of the initial layers to create a final stacked structure that incorporates a gate structure.

Career Highlights

Throughout his career, Enning Zhang has worked with notable companies in the semiconductor industry. He has been associated with Semiconductor Manufacturing International Corporation in Shanghai and Beijing. His experience in these organizations has allowed him to develop and refine his expertise in semiconductor technologies.

Collaborations

Enning Zhang has collaborated with talented individuals in his field, including Haiyang Zhang and Zhenyang Zhao. These collaborations have contributed to the advancement of semiconductor innovations.

Conclusion

Enning Zhang is a key figure in semiconductor innovation, with a focus on improving fabrication methods and structures. His contributions continue to influence the industry and pave the way for future advancements.