Enid K Sichel

Title: Enid K Sichel: Innovator in Semiconductor Technology

Introduction

Enid K Sichel is a prominent inventor based in Lincoln, MA (US), known for her contributions to semiconductor technology. With a total of 5 patents, she has made significant advancements in the field, particularly in the development of semiconductor devices and digital storage systems.

Latest Patents

One of her latest patents is for a semiconductor device with conductive rectifying rods. This innovative device, specifically a Field Effect Transistor (FET), features a body composed of a matrix of semiconductor material, particularly silicon, which contains an array of individual rods made of conductive material, specifically TaSi₂. These rods create Schottky barriers with the semiconductor material, allowing for controlled current flow by applying biasing potential to the gate contact. Another notable patent is for a digital storage system that represents digital information through marks formed in response to energy delivered by an optical beam. This system utilizes a material that undergoes pyrolysis to create marks at selected locations, showcasing her expertise in optical technologies.

Career Highlights

Throughout her career, Enid has worked with esteemed organizations such as GTE Laboratories Incorporated and the Massachusetts Institute of Technology. Her work in these institutions has allowed her to push the boundaries of semiconductor research and development.

Collaborations

Enid has collaborated with notable colleagues, including Michael F Rubner and Brian M Ditchek, contributing to various projects that have furthered the field of semiconductor technology.

Conclusion

Enid K Sichel's innovative work in semiconductor devices and digital storage systems has established her as a key figure in her field. Her patents reflect her commitment to advancing technology and her impact on the industry is undeniable.