Company Filing History:
Years Active: 2022-2024
Title: Eng Hock Lee: Innovator in Lithography Systems
Introduction
Eng Hock Lee is a notable inventor based in Hsinchu, Taiwan. With a keen focus on advancements in lithography technology, he has made significant contributions through his inventions. Lee holds a total of two patents, showcasing his innovative spirit and technical expertise in this specialized area.
Latest Patents
Among his latest inventions is a cutting-edge lithography exposure system. This system is designed to include a light source, a substrate stage, and a mask stage situated along an optical path that connects the light source to the substrate stage. Importantly, the lithography exposure system incorporates a reflector within this optical path. This reflector is a multilayered structure that features a first layer made of a specific material with a defined thickness, a second layer composed of the same material but with a different thickness, and a third layer containing a different material situated between the first and second layers.
Career Highlights
Eng Hock Lee has made his mark at Taiwan Semiconductor Manufacturing Company Limited, where he contributes his expertise to the design and development of innovative semiconductor manufacturing processes. His background in lithography systems is pivotal in advancing the technologies employed by the company in high-precision microfabrication.
Collaborations
Throughout his career, Lee has collaborated closely with professionals in his field, including his coworker Wen-Hao Cheng. Together, they work to push the boundaries of lithographic techniques, driving innovation and efficiency in semiconductor production.
Conclusion
Eng Hock Lee's contributions to lithography systems reflect his commitment to technological advancement in the semiconductor industry. As he continues to innovate through his patents and collaborate with his peers, Lee remains a significant figure in the evolution of lithographic technology. His work not only advances industry standards but also inspires future innovations in engineering and manufacturing.